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If you have specific technology licensing needs that you think HP can help you with, we invite you to contact us.
Conventional semiconductor processes rely on light to produce patterns of circuits on silicon wafers, but as feature size becomes smaller, light or even UV is no longer adequate for features as small as 30 nanometers. HP’s Nanoimprint lithography uses an imprint method that allows the creation of features as small as 15 nanometers. HP’s key advantage is in mold-to-wafer alignment and process stability at a lower cost for the tool.
Nanotechnology is a booming industry in everything from semiconductors to energy. One disadvantage of such tiny structures is that it is difficult to align structures with each other. HP has developed a long line of alignment and displacement measurement technology that works at the micro level as well as the nano level that uses only standard optical instruments. The HP alignment and displacement measurement technology requires no valuable chip real estate for special alignment marks or patterns.
The rapid evolution of the field of transparent electronics may hold the key to new industries and many new, more effective or less costly consumer products. Uses could range from transparent displays in the windshield of an automobile to cell phones, televisions, copiers, "smart" glass or even game and toys.
Transparent transistors can be created using new materials, which are called amorphous heavy-metal cation multi-component oxides. The electronic capabilities of these materials compare with organic and polymer materials that are the basis of millions of dollars of research development each year.
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